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Chemical Process on Aspen Plus

   

Added on  2023-04-23

7 Pages1063 Words361 Views
Running head- CHEMICAL PROCESS ON ASPEN PLUS
CHEMICAL PROCESS ON ASPEN PLUS
Chemical Process on Aspen Plus_1
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CHEMICAL PROCESS ON ASPEN PLUS
Table of Contents
Introduction-....................................................................................................................................3
Dehydration Process Using Aspen Hysis Simulation......................................................................3
Cryogenic Distillation Process........................................................................................................4
Conclusion-......................................................................................................................................6
References........................................................................................................................................6
Chemical Process on Aspen Plus_2
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CHEMICAL PROCESS ON ASPEN PLUS
Introduction-
In order to design the chemical process based on Aspen Plus, the acid removal steps are
designed along with the reactions involved in removing the CO2 and H2S, using the Anti-
Solvent Swing Regeneration method, the Natural Gas Liquids along with heavy hydrocarbons
are also separated.
Dehydration Process Using Aspen Hysis Simulation
The dehydration method is a process used in chemical reaction to remove the water content from
the reaction. The water needs to be removed from the chemical processing of CO2 to avoid
corrosion. Sulphuric acid is a common agent used for chemical dehydration. There are different
methods used for dehydration, the most common method is the process of water condensing,
cooling and gas or water separation.
Procedure:
The most used process of removing the acid components is absorption in alkanolamine
based solvents. During the process, the components of the acid react with the absorption liquid of
alkanolamine, with the help of reversible followed by exothermic reaction in the gas contractor,
though liquid contactor is also used. During the steps of the reaction, the components of the acid
are removed from the solvent with the help of regenerator, which is generally at high temperature
or maybe at low temperature. The alkanolamines generally used are MEA (monoethanolamine),
DEA (diethanolamine), DIPA (diisopropanol amine) along with MDEA (N
Chemical Process on Aspen Plus_3

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